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C Carbon - Sputtering Target

Melting point: 3550 °C (diamond) Boiling point: 3800 °C (sublimation)

A sputtering target is a disc of a high purity material used as an atomic sputtering source for ion beam bombardment. Please contact us if your required sputtertarget size and/ or purity are not listed.

Sputtering Target

Carbon - Sputtering Target - Your product selection

C-00100 Carbon sputtering target

Details: dimensions on customers demand

Purity:

CAS No: [7782-42-5]

Further information:

C-00101 Carbon sputtering target

Details: diam. 76.2mm x 5mm thickness

Purity: 99,99 %

CAS No: [7782-42-5]

Further information:

Back to periodic system of elements

Company News

EU Regulation regarding C9-C14 PFCA

EVOCHEM complies with tomorrow’s regulations

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Visit us: 26 - 29 April 2022 in Munich

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Visit us at the MIDO in Milan – 30 April until May 2

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Pure and ultrapure metals

Pure and ultrapure Metals

C Carbon - Sputtering Target

Carbon - Sputtering Target - Your product selection

C-00100 Carbon sputtering target

C-00101 Carbon sputtering target

Company News

EU Regulation regarding C9-C14 PFCA

Vision Expo East

Laser World of Photonics 2022

MIDO 2022