B Boron - Sputtering Target

Optical characteristics include transmitting portions of the infrared. Boron is a poor conductor of electricity at room temperature but a good conductor at high temperature.

Melting point: 2075 °C Boiling point: 4000 °C

A sputtering target is essentially a disc made from a high-purity material, specifically designed to serve as an atomic sputtering source during ion beam bombardment processes. These sputter targets play a crucial role in various applications, including thin film deposition and materials science research. If you find that the size or purity of the sputtering target you need is not included in our current listings, please do not hesitate to reach out to us for assistance. We are here to help!