Hf Hafnium - Sputtering Target

Hafnium is a ductile metal with a brilliant silver luster. Its properties are considerably influenced by presence of zirconium impurities. Of all the elements, zirconium and hafnium are two of the most difficult to separate. Although their chemistry is almost identical, the density of zirconium is about half of hafnium. Very pure hafnium has been produced, with zirconium being the major impurity.

Melting point: 2233 °C Boiling point: 4603 °C

A sputtering target is essentially a disc made from a high-purity material, specifically designed to serve as an atomic sputtering source during ion beam bombardment processes. These sputter targets play a crucial role in various applications, including thin film deposition and materials science research. If you find that the size or purity of the sputtering target you need is not included in our current listings, please do not hesitate to reach out to us for assistance. We are here to help!