Tantalum is a gray, heavy, and very hard metal. When pure, it is ductile and can be drawn into fine wire, which is used as a filament for evaporating metals such as aluminum. Tantalum is almost completely immune to chemical attack at temperatures below 150°C, and is attacked only by hydrofluoric acid, acidic solutions containing the fluoride ion, and free sulfur trioxide.
Melting point: 3017 °C Boiling point: 5458 °C
A sputtering target is a disc of a high purity material used as an atomic sputtering source for ion beam bombardment. Please contact us if your required sputtertarget size and/ or purity are not listed.
