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Tm Thulium - Sputtering Target

Thulium can be isolated by reduction of the oxide with lanthanum metal or by calcium reduction of a closed container. The element is silver-gray, soft, malleable, and ductile, and can be cut with a knife.

Melting point: 1545 °C Boiling point: 1950 °C

A sputtering target is a disc of a high purity material used as an atomic sputtering source for ion beam bombardment. Please contact us if your required sputtertarget size and/ or purity are not listed.

Sputtering Target Sputtering Target

Thulium - Sputtering Target - Your product selection

Tm-00100 Thulium sputtering target

Details: dimensions on customers demand
Purity: standard purity 99,9%
CAS No: [7440-30-4]
Further information: air and moisture sensitive

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